US Patent Issued to SAMSUNG ELECTRONICS on April 21 for "Reticle masking device, substrate processing apparatus including the same, and substrate processing method using the same" (South Korean Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,940, issued on April 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Reticle masking device, substrate processing apparatus including the same, and substrate processing method using the same" was invented by Sanghwan Lee (Suwon-si, South Korea), Dohyung Kim (Suwon-si, South Korea), Jinhong Park (Suwon-si, South Korea) and Sungbin Jeon (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a reticle masking device, a substrate processing apparatus, and a substrate processing method. The reticle masking device comprises a first masking device that provides a mask hole, a second masking device th...