ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,944, issued on April 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Extreme ultraviolet source cleaning apparatus, EUV source cleaning method using the same, and substrate processing method including the same" was invented by Chulmin Cho (Suwon-si, South Korea), Youngduk Suh (Suwon-si, South Korea), Kyoungwhan Oh (Suwon-si, South Korea), Sanghyun Lim (Suwon-si, South Korea), Youngkyun Im (Suwon-si, South Korea), Jaehong Lim (Suwon-si, South Korea), Dohyun Jung (Suwon-si, South Korea), Seok Heo (Suwon-si, South Korea) and Youngho Hwang (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate proce...