US Patent Issued to SAMSUNG ELECTRONICS on April 21 for "Defect inspection device and defect inspection method" (South Korean Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,573, issued on April 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Defect inspection device and defect inspection method" was invented by Minsu Kim (Suwon-si, South Korea), Seungryeol Oh (Suwon-si, South Korea) and Jeongho Ahn (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection device includes a stage on which a substrate is provided, an objective lens disposed above the stage to project light onto the substrate, a light source configured to emit light onto a main surface of the substrate via the objective lens, a light quantity measurement sensor disposed above the stage and config...