ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,212, issued on Aug. 4, was assigned to SAMSUNG ELECTRONICS Co. LTD. and WONIK Materials Co. Ltd..
"Method for fabricating trihalodisilane and method for fabricating semiconductor device using the same" was invented by Ji Eun Yun (Busan, South Korea), Byung Keun Hwang (Seongnam-si, South Korea), Min Soo Kang (Sejong-si, South Korea), Sheby Mary George (Cheongju-si, South Korea), Woo Ri Bae (Yongin-si, South Korea), Sun Hye Hwang (Hwaseong-si, South Korea), Seong Tae Oh (Suwon-si, South Korea) and Byeong Ok Cho (Cheongju-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for fabricating trihalodisilane, the method includes providin...