US Patent Issued to SAMSUNG ELECTRONICS, New Power Plasma on Nov. 3 for "Substrate processing apparatus" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,040, issued on Nov. 3, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and New Power Plasma Co. Ltd. (Gyeonggi-do, South Korea).

"Substrate processing apparatus" was invented by Kyung Min Lee (Suwon-si, South Korea), Myung Jae Yoo (Suwon-si, South Korea), Sung-Yeol Kim (Suwon-si, South Korea), Sang Yeol Park (Suwon-si, South Korea), Sung Yong Lim (Suwon-si, South Korea), Eun Suk Lim (Suwon-si, South Korea), Min Ju Jeong (Suwon-si, South Korea) and Yong Won Cho (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus including the controller are provided. The controller includes: a ...