US Patent Issued to SAMSUNG ELECTRONICS, DCT MATERIAL on Aug. 4 for "Semiconductor photoresist composition and method of forming patterns using the composition" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,319, issued on Aug. 4, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea) and DCT MATERIAL LLC (Chungcheongbuk-do, South Korea).

"Semiconductor photoresist composition and method of forming patterns using the composition" was invented by Chawon Koh (Suwon-si, South Korea), Yeon Hee Seong (Suwon-si, South Korea), Tsunehiro Nishi (Suwon-si, South Korea), Geun Su Lee (Suwon-si, South Korea), Sung Jae Jung (Suwon-si, South Korea), Moo Hyun Koh (Suwon-si, South Korea), Ji Young Park (Suwon-si, South Korea) and Seungyeol Baek (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a semic...