US Patent Issued to SAMSUNG ELECTRONICS, DAEGU GYEONGBUK INSTITUTE OF SCIENCE & Technology on Aug. 25 for "Vacuum tunneling device and method of manufacturing the same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,124, issued on Aug. 25, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and DAEGU GYEONGBUK INSTITUTE OF SCIENCE & Technology.

"Vacuum tunneling device and method of manufacturing the same" was invented by Changhoon Jeon (Goyang-si, South Korea), Jaeeun Jang (Daegu, South Korea), Sujin Heo (Pohang-si, South Korea), Sohee Kim (Daegu, South Korea), Hyunwoo Jang (Daegu, South Korea) and Gisoon Choi (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a vacuum tunneling device, the method including forming a tunnelling device on a substrate; forming an insulating interlayer on the substrate ...