ALEXANDRIA, Va., March 24 -- United States Patent no. 12,586,728, issued on March 24, was assigned to SAMSUNG ELECTRO-MECHANICS Co. LTD. (Suwon-si, South Korea).
"Multilayered capacitor and manufacturing method thereof" was invented by Hyoju Lee (Suwon-si, South Korea), Jinwoo Kim (Suwon-si, South Korea), Seokhyun Yoon (Suwon-si, South Korea), Heesun Chun (Suwon-si, South Korea) and Tae Hyung Kim (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A multilayered capacitor including a capacitor body including a dielectric layer and an internal electrode, and an external electrode on the capacitor body, wherein the dielectric layer includes a plurality of dielectric crystal grains, at least o...