US Patent Issued to Samsung Display, Samsung Electronics on July 21 for "Correction method of multi-beam exposure device" (South Korean Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,789, issued on July 21, was assigned to Samsung Display Co. LTD. (Gyeonggi-do, South Korea) and Samsung Electronics Co. Ltd (Gyeonggi-do, South Korea).

"Correction method of multi-beam exposure device" was invented by Choulwon Min (Yongin-si, South Korea) and Sukjong Bae (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A correction method may include generating a first function that is a relational expression between a gray level of an edge beam among beams and a variation amount in size of a pattern according to a second beam adjacent to the edge beam, obtaining a second function that is a relational expression between the fir...