US Patent Issued to Rutgers, The State University of New Jersey on Aug. 4 for "Systems and methods for combinatorial arrays using dynamic interference lithography" (New Jersey Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,325, issued on Aug. 4, was assigned to Rutgers, The State University of New Jersey (New Brunswick, N.J.).

"Systems and methods for combinatorial arrays using dynamic interference lithography" was invented by Ki-Bum Lee (Monmouth Junction, N.J.) and Letao Yang (Piscataway, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dynamic interference lithography (DIL) device is provided. The device includes a laser source configured for providing a laser beam, a substrate stage configured for mounting a substrate, an at least partially convex curved mirror, and a spatial filter configured to divide the laser beam into a first beam portion directed towards...