ALEXANDRIA, Va., May 12 -- United States Patent no. 12,624,302, issued on May 12, was assigned to RONDA HIGH TECH S.R.L. (Zane', Italy).
"Method and reactor for processing a gas" was invented by Shahram Roshanpour (Vicenza, Italy) and Anton Danilenko (Kharkov, Ukraine).
According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing method for a gas includes: supplying a gas inside a cavity for plasma processing, supplying microwaves having a predetermined frequency and power in order to generate a plasma of the gas, and propagating the microwaves in the gas by a waveguide which communicates directly with the cavity so as to provide a plasma cracking processing operation for the gas inside the cavity."
The...