US Patent Issued to RIKEN TECHNOS on June 23 for "Composite film manufacturing method and organic/inorganic hybrid film manufacturing method" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,729, issued on June 23, was assigned to RIKEN TECHNOS Corp. (Tokyo).

"Composite film manufacturing method and organic/inorganic hybrid film manufacturing method" was invented by Kohei Nakashima (Tokyo) and Taketo Hashimoto (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is a composite film manufacturing method in which a sputtering device is used and a gas of a substance with which can be prepared a mixed gas of a target of a solid substance in a standard state (a temperature of 25deg C. and pressure of 100 KPa) (A) and a sputtering gas (B) is used. The method includes: (1) a step for attaching the target (A) to a target ...