ALEXANDRIA, Va., July 15 -- United States Patent no. 12,661,687, issued on June 23, was assigned to RICOH COMPANY LTD. (Tokyo).

"Film forming method and film forming apparatus" was invented by Naohiro Toda (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film forming method for forming a film on a target coating material includes coating a target coating material by discharging liquid from each of a plurality of discharge heads that are arranged in a conveyance direction of the target coating material to be conveyed, wherein the liquid discharged from each of the plurality of discharge heads is applied to a different location on the target coating material in the conveyance direction."

The ...