US Patent Issued to RESONAC on May 26 for "Photocurable composition, cured product of same, photofusible resin composition and adhesive set" (Japanese Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,637,600, issued on May 26, was assigned to RESONAC Corp. (Tokyo).

"Photocurable composition, cured product of same, photofusible resin composition and adhesive set" was invented by Yuki Miyamoto (Tokyo), Masahito Watanabe (Tokyo) and Takashi Kumaki (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a photocurable composition containing a dithiol compound having a disulfide bond, a compound having two ethylenically unsaturated groups, a hydrogen abstraction type photoradical generator, and an intramolecular cleavage type photoradical generator."

The patent was filed on Oct. 13, 2021, under Application No. 17/926,667.

*For further informa...