US Patent Issued to Rensselaer Polytechnic Institute on May 19 for "High absorption photovoltaic material having a gradient refractive index profile and methods of making the same" (Canadian, American, Taiwanese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,287, issued on May 19, was assigned to Rensselaer Polytechnic Institute (Troy, N.Y.).

"High absorption photovoltaic material having a gradient refractive index profile and methods of making the same" was invented by Ping Kuang (Latham, N.Y.), Shawn Yu Lin (Troy, N.Y.), Anthony Post (Catskill, N.Y.), Sajeev Oommen John (Mississauga, Canada), Sergey Leonidovich Eyderman (Toronto) and Mei-Li Hsieh (MiaoLi County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A high absorption photovoltaic material and method of making the material for use in a solar cell are disclosed. The photovoltaic material includes a surface modified with a layer of repeati...