ALEXANDRIA, Va., July 28 -- United States Patent no. 12,691,437, issued on July 28, was assigned to QILU UNIVERSITY OF TECHNOLOGY SHANDONG ACADEMY (Jinan, China).
"Bismuth/bismuth titanate heterojunction hollow nanospheres and method for preparing the same and application thereof" was invented by Wei Zhou (Jinan, China), Xuepeng Wang (Jinan, China), Zhenzi Li (Jinan, China), Liping Guo (Jinan, China), Shijie Wang (Jinan, China), Lijun Liao (Jinan, China), Bo Wang (Jinan, China), Hongqi Chu (Jinan, China) and Zhangqian Liang (Jinan, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention belongs to the field of new material technology and relates to a bismuth/bismuth titanate heterojunction...