ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,546, issued on April 7, was assigned to PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION (Busan, South Korea).
"Method for manufacturing silicon-coated copper, silicon-coated anti-oxidation copper using same, and semiconductor device using same" was invented by Se Young Jeong (Busan, South Korea) and Su Jae Kim (Busan, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A silicon-coated oxidation-resistant copper includes a SiCuOx layer includes a silicon (Si)-oxygen (O)-copper (Cu) mixed layer formed by depositing silicon (Si). The silicon-coated oxidation-resistant copper includes: a copper layer; the SiCuOx layer includ...