US Patent Issued to PUKYONG NATIONAL UNVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION on March 17 for "Bismuth halide compound-PDMS composite material for X-ray shielding and manufacturing method thereof" (South Korean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,580,090, issued on March 17, was assigned to PUKYONG NATIONAL UNVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION (Busan, South Korea).

"Bismuth halide compound-PDMS composite material for X-ray shielding and manufacturing method thereof" was invented by Junghwan Kim (Busan, South Korea), Seok Gyu Kang (Gimhae-si, South Korea), Ha Yeong Kang (Hadong-gun, South Korea) and Dae Seong Kwon (Gimhae-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a lead-free X-ray shielding material using a bismuth halide compound is provided, the method including a first step of producing porous PDMS (Polydimethylsiloxane); a second st...