ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,463, issued on Sept. 15, was assigned to PSK INC. (Gyeonggi-Do, South Korea).
"Substrate treatment apparatus and substrate treatment method" was invented by A Ram Kim (Hwaseong-si, South Korea) and Jong Woo Park (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides an apparatus for treating a substrate. The apparatus for treating a substrate may include: a process treatment unit that provides a treatment space in which the substrate is treated; and a plasma generation unit that is provided above the process treatment unit and generates plasma from a process gas. The plasma generation unit includes: ...