ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,725,765, issued on Sept. 1, was assigned to PSK INC. (Hwaseong-si, South Korea).
"Apparatus for treating substrate and method for treating substrate" was invented by Kwang Sung Yoo (Hwaseong-si, South Korea) and Jong Chan Lee (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space; a support unit positioned within the treating space and configured to apply a power and to support a substrate; and a plasma control unit configured to change a characteristic of a plasma formed in the treating space, and ...