US Patent Issued to Powerchip Semiconductor Manufacturing on Aug. 4 for "Photomask and manufacturing method of semiconductor device" (Taiwanese Inventor)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,313, issued on Aug. 4, was assigned to Powerchip Semiconductor Manufacturing Corp. (Hsinchu, Taiwan).

"Photomask and manufacturing method of semiconductor device" was invented by Yi-Kai Lai (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask includes a plurality of main patterns, a plurality of first sub-resolution assist feature patterns and a plurality of second sub-resolution assist feature patterns. The first sub-resolution assist feature patterns are located aside the main patterns. The second sub-resolution assist feature patterns are disposed between and connected to adjacent two of the first sub-resolution assist ...