US Patent Issued to Power Support on Sept. 29 for "Wet etching composition for etching a glass comprising hydrofluoric acid, oxalic acid, acetic acid, and a surfactant, wet etching method of a glass, and patterned glass by the wet etching method" (South Korean, Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,748,242, issued on Sept. 29, was assigned to Power Support Co. Ltd. (Tokyo).

"Wet etching composition for etching a glass comprising hydrofluoric acid, oxalic acid, acetic acid, and a surfactant, wet etching method of a glass, and patterned glass by the wet etching method" was invented by Sang-Ro Lee (Gyeonggi-do, South Korea) and Katsushi Igarashi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wet etching method according to the present disclosure includes cleaning the glass, forming a nanoscale pattern by wet-etching the cleaned glass, and cleaning and drying the nano-patterned glass, wherein a wet etching solution used in the wet etching in...