US Patent Issued to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION on May 12 for "Apparatus and method for setting semiconductor parameter" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,618, issued on May 12, was assigned to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Apparatus and method for setting semiconductor parameter" was invented by Rock Hyun Baek (Pohang-si, South Korea) and Hyeok Yun (Ulsan, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a method and apparatus for setting a semiconductor parameter. The method for setting a semiconductor parameter according to an embodiment of the present disclosure is a method performed on a computing apparatus including one or more processors and a memory storing one or more programs executed by the one or more processors, the ...