US Patent Issued to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION on March 3 for "Nitric oxide-sensitive hydrogel" (South Korean Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,564,598, issued on March 3, was assigned to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Nitric oxide-sensitive hydrogel" was invented by Won Jong Kim (Pohang-si, South Korea) and Tae Jeong Kim (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a nitric oxide-sensitive hydrogel. The hydrogel is formed through in-situ hybridization in a target site by means of a click chemical reaction and is prepared using a nitric oxide-sensitive crosslinker. The hydrogel can effectively collect and scavenge nitric oxide overexpressed in the target site, and a drug loaded in the hy...