US Patent Issued to POSTECH ACADEMY-INDUSTRY FOUNDATION on March 31 for "Humidity sensitive nano-photonics and manufacturing method thereof" (South Korean Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,079, issued on March 31, was assigned to POSTECH ACADEMY-INDUSTRY FOUNDATION (Pohang-si, South Korea).

"Humidity sensitive nano-photonics and manufacturing method thereof" was invented by Jun Suk Rho (Pohang-si, South Korea), Byoung Su Ko (Pohang-si, South Korea), Young Hwan Yang (Pohang-si, South Korea), Jae Kyoung Kim (Pohang-si, South Korea) and Trevon Badloe (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to humidity sensitive nano-photonics and a manufacturing method thereof, and more particularly to humidity sensitive nano-photonics including a metasurface and a method for manufacturing th...