US Patent Issued to PI Advanced Materials on Dec. 30 for "Polyimide film for graphite sheet, manufacturing method therefor, and graphite sheet manufactured therefrom" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,509,554, issued on Dec. 30, was assigned to PI Advanced Materials Co. Ltd. (Chungcheongbuk-do, South Korea).

"Polyimide film for graphite sheet, manufacturing method therefor, and graphite sheet manufactured therefrom" was invented by Hyeong Seop Jung (Chungcheongbuk, South Korea) and Dong Young Won (Chungcheongbuk, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are a polyimide film for graphite sheets, a method of fabricating the same, and a graphite sheet fabricated using the same. The polyimide film is fabricated by imidizing a polyamic acid formed by reaction between a dianhydride monomer and a diamine monomer, wherein t...