US Patent Issued to PHOTRONICS on July 21 for "System, method and program product for photomask surface treatment" (Texas, Idaho Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,687,775, issued on July 21, was assigned to PHOTRONICS INC. (Brookfield, Conn.).

"System, method and program product for photomask surface treatment" was invented by Christopher Progler (Plano, Texas) and Young Mog Ham (Meridian, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a photomask including the steps of providing a photomask blank, inspecting the photomask blank to determine presence of one or more defects in the photomask blank, wherein the one or more defects comprise one or more photomask substrate defects, and compensating for the one or more photomask substrate defects by roughening one or more surface portion...