US Patent Issued to Phosertek on Oct. 20 for "Laser device and method of manufacturing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,771,095, issued on Oct. 20, was assigned to Phosertek Corp. (Hsinchu City, China).

"Laser device and method of manufacturing the same" was invented by Yu-Chen Chen (Hsinchu City, Taiwan), Chien-Hung Lin (Hsinchu City, Taiwan), Bo-Tsun Chou (Hsinchu City, Taiwan) and Chih-Yuan Weng (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A laser device includes a first waveguiding layer, an active layer, a second waveguiding layer, a contact layer, a first insulating layer, a plurality of hole fillings, a first electrode, and a second electrode. The first waveguiding layer, the active layer, the second waveguiding layer, and the contact layer...