US Patent Issued to Pallidus on May 5 for "Vapor deposition apparatus and techniques using high purity polymer derived silicon carbide" (Texas Inventor)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,617,686, issued on May 5, was assigned to Pallidus Inc. (Albany, N.Y.).

"Vapor deposition apparatus and techniques using high purity polymer derived silicon carbide" was invented by Mark S. Land (Houston).

According to the abstract* released by the U.S. Patent & Trademark Office: "Organosilicon chemistry, polymer derived ceramic materials, and methods. Such materials and methods for making polysilocarb (SiOC) and Silicon Carbide (SIC) materials having 3-nines, 4-nines, 6-nines and greater purity. Vapor deposition processes and articles formed by those processes utilizing such high purity SiOC and SiC."

The patent was filed on June 26, 2023, under Application No. 18/214,324.

*For furt...