US Patent Issued to OTSUKA CHEMICAL on Sept. 8 for "Friction adjusting material, friction material composition, friction material, and friction member" (Japanese Inventor)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,737, issued on Sept. 8, was assigned to OTSUKA CHEMICAL Co. LTD. (Osaka, Japan).

"Friction adjusting material, friction material composition, friction material, and friction member" was invented by Emiko Daimon (Tokushima-city, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a friction modifier giving excellent formability in producing a friction material and capable of reducing rust formation on a rotor even when the moisture-absorbed friction material is left pressed against the rotor for a long. The friction modifier is made of a titanate compound having a tunnel crystal structure, wherein the titanate compound has a rate of chlo...