ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,215, issued on July 14, was assigned to OTI Lumionics Inc. (Mississauga, Canada).
"Silicon-containing compounds for forming a patterning coating and devices incorporating same" was invented by Michael Helander (Mississauga, Canada) and Scott Nicholas Genin (Mississauga, Canada).
According to the abstract* released by the U.S. Patent & Trademark Office: "A layered semiconductor device comprising a compound, the compound comprising a silicon-oxygen backbone and at least one fluorine-containing moiety attached to the silicon-oxygen backbone. The compound may comprise a unit represented by: formula (I) wherein R and R' each independently represents at least one of: substituted or uns...