ALEXANDRIA, Va., April 15 -- United States Patent no. 12,600,014, issued on April 14, was assigned to ORC MANUFACTURING Co. LTD. (Tokyo).
"Method and apparatus for holding substrate" was invented by Shuichi Shimizu (Tokyo) and Fumiya Suzuki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for holding a substrate includes a table, a lifting and lowering mechanism configured to mount a substrate on the table, and at least one pressing member configured to press the substrate to the table from the peripheral side of the substrate, in which the pressing member is movable upward and downward. The apparatus further includes at least one detector configured to detect a warp of the substrate mounte...