ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,205, issued on March 24, was assigned to Onto Innovation Inc. (Wilmington, Mass.).
"Low numerical aperture alignment" was invented by J. Casey Donaher (Westford, Mass.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein are examples of a photolithography machine with fast alignment. The machine may include a stage to hold and move a substrate and a projection system to project images on a plurality of exposure regions of the substrate. The machine may also include an alignment system positioned adjacent to the projection system. The alignment system may include a plurality of microscope cameras with a fixed focus, each microscope camera...