US Patent Issued to Onto Innovation on March 17 for "Optical metrology with nuisance feature mitigation" (California Inventor)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,914, issued on March 17, was assigned to Onto Innovation Inc. (Wilmington, Mass.).

"Optical metrology with nuisance feature mitigation" was invented by Jonathan Andrew Miller (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sample that includes a target structure with a structure-of-interest (SOI) having a set of known parameters optically coupled to an unknown structure, e.g., having unknown parameters, is optically measured using light that is incident on the target structure. Light detected from the target structure in response to the incident illumination light incident is used to obtain metrology data, which is a combination o...