US Patent Issued to Onto Innovation on Feb. 24 for "Photo response non-uniformity correction during semiconductor inspection" (Texas Inventor)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,550, issued on Feb. 24, was assigned to Onto Innovation Inc. (Wilmington, Mass.).

"Photo response non-uniformity correction during semiconductor inspection" was invented by John M. Thornell (Richardson, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "Image sensors assist in inspecting semiconductor substrates, including semiconductor wafers, during the semiconductor manufacturing process. However, due to the non-uniformity of cells between image sensors, which is referred to as photo response non-uniformity (PRNU), each image sensor can generate a different voltage level when illuminated with a uniform light source, which leads to a luminance i...