US Patent Issued to OLAS, CHEMPOLE on July 28 for "Photosensitive polymer and resist composition having the same" (South Korean Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,692,335, issued on July 28, was assigned to OLAS Co. LTD. (Cheonan-si, South Korea) and CHEMPOLE Co. LTD. (Suwon-si, South Korea).

"Photosensitive polymer and resist composition having the same" was invented by Sang Jun Choi (Seoul, South Korea), Youngsun Kim (Hwaseong-si, South Korea) and Jaebuem Oh (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a photosensitive polymer including a repeating unit of Chemical Formula 1 or Chemical Formula 2 derived from a vinyl heteroaromatic compound and a resist composition including the same.In Chemical Formula 1 or 2, R1 and R2 are hydrogen or a methyl group, X is a carbon, sulfur...