US Patent Issued to NuFlare Technology on May 5 for "Blanking aperture array system and multi charged particle beam writing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,545, issued on May 5, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Blanking aperture array system and multi charged particle beam writing apparatus" was invented by Shuji Yoshino (Kunitachi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In one embodiment, a blanking aperture array system includes a blanking aperture array substrate provided blankers corresponding to each beam of a multi beam, a first radiation shield, and a second radiation shield. A circuit section applying a voltage to the blankers is disposed closer to a peripheral edge than a cell section including the blankers. The first radiation shield includes a first pla...