US Patent Issued to NuFlare Technology on March 17 for "Pattern inspection apparatus and pattern inspection method inspecting a pattern using an image corrected using offset amount based upon dark noise levels" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,579,635, issued on March 17, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Pattern inspection apparatus and pattern inspection method inspecting a pattern using an image corrected using offset amount based upon dark noise levels" was invented by Ryoichi Hirano (Setagaya-ku, Japan), Yasuhiro Yamashita (Yokohama, Japan) and Hiromu Inoue (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pattern inspection apparatus includes an illumination optical system to illuminate an inspection substrate on which a pattern is formed, an offset calculation circuit to calculate an offset amount which depends on an image accumulation time of...