US Patent Issued to NuFlare Technology on April 21 for "Multi charged particle beam writing method and multi charged particle beam writing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,278, issued on April 21, was assigned to NuFlare Technology Inc. (Yokohama, Japan).

"Multi charged particle beam writing method and multi charged particle beam writing apparatus" was invented by Tsubasa Nanao (Yokohama, Japan) and Osamu Iizuka (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The mark position is measured with a multi-beam with high accuracy. A multi charged particle beam writing method includes forming a multi-beam in which charged particle beams are arranged with a predetermined pitch, irradiating a mark with beams in an on-beam region while shifting irradiation positions of the charged particle beams by sequentiall...