US Patent Issued to NPS on April 14 for "Heat source device, substrate support device and substrate processing facility" (South Korean Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,369, issued on April 14, was assigned to NPS Corp. (South Korea).

"Heat source device, substrate support device and substrate processing facility" was invented by Won Sik Nam (Hwaseong-si, South Korea), Kang Heum Yeon (Osan-si, South Korea) and Dae Seok Song (Osan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present inventive concept relates to a heat source device, a substrate support device, and a substrate processing facility comprising the same. According to the present inventive concept, a substrate can be uniformly heated and stably supported by a chamber having an inner space where the substrate is treated, and a substr...