ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,642, issued on Sept. 29, was assigned to NOVA MEASURING iNSTRUMENTS iNC. (Fremont, Calif.).
"Patterned X-ray emitting target" was invented by David A. Reed (Belmont, Calif.), Bruce H. Newcome (Sunnyvale, Calif.) and Bruno W. Schueler (San Jose, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting target...