US Patent Issued to NOKIA TECHNOLOGIES on Nov. 3 for "Spatial pattern adaptation" (French Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,778, issued on Nov. 3, was assigned to NOKIA TECHNOLOGIES OY (Espoo, Finland).

"Spatial pattern adaptation" was invented by Matha Deghel (Massy, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "Example embodiments of the present disclosure relate to spatial pattern adaptation. An apparatus determines, based at least on a spatial pattern switching between at least two spatial patterns of a network device, one or more reference signal, RS, resources or RS occurrences from a plurality of RS resources or RS occurrences. The apparatus transmits, to the network device, at least one report comprising one or more measurements based at least on the one o...