US Patent Issued to Niterra Materials on Oct. 27 for "Silicon nitride sintered body, wear-resistant member, and method for manufacturing silicon nitride sintered body" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,255, issued on Oct. 27, was assigned to Niterra Materials Co. Ltd. (Yokohama, Japan).

"Silicon nitride sintered body, wear-resistant member, and method for manufacturing silicon nitride sintered body" was invented by Kazuya Ookubo (Fujisawa Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "According to an embodiment, a silicon nitride sintered body includes silicon nitride crystal grains and a grain boundary phase, and in a case where Raman spectroscopy of a 20 micro metrex20 micro metre region in a central cross section of the silicon nitride sintered body is performed, two or more peaks are detected in ranges of 780 cm-1 to 810 cm-1 a...