US Patent Issued to NISSAN CHEMICAL on March 17 for "Upper film-forming composition and method for producing phase-separated pattern" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,644, issued on March 17, was assigned to NISSAN CHEMICAL Corp. (Tokyo).

"Upper film-forming composition and method for producing phase-separated pattern" was invented by Ryuta Mizuochi (Toyama, Japan), Sho Shimizu (Toyama, Japan) and Mamoru Tamura (Toyama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An upper layer film-forming composition exhibits good solubility in hydrophobic solvents and can bring about vertical alignment of a block copolymer without dissolution, swelling or the like of a layer containing the block copolymer formed on a substrate. This upper layer film-forming composition is used for phase separation of a layer containi...