US Patent Issued to NIKON on July 28 for "Exposure apparatus, exposure method, and manufacturing method for electronic device" (Japanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,601, issued on July 28, was assigned to NIKON Corp. (Tokyo).

"Exposure apparatus, exposure method, and manufacturing method for electronic device" was invented by Masaki Kato (Yokohama, Japan), Hitoshi Mizuno (Yokohama, Japan) and Yasushi Mizuno (Saitama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An exposure apparatus includes an illumination optical system, a spatial light modulator illuminated by light from the illumination optical system, a projection optical system that irradiates an exposure target with light emitted from the spatial light modulator, a stage on which the exposure target is placed to perform a relative movement betwee...