US Patent Issued to NIKE on May 12 for "Methods, systems, and articles for producing a film pattern on a substrate material" (American, Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,622,475, issued on May 12, was assigned to NIKE Inc. (Beaverton, Ore.).

"Methods, systems, and articles for producing a film pattern on a substrate material" was invented by Cody Evin Janes (Beaverton, Ore.), Daniel P. Morgan (Beaverton, Ore.), Kyle Schepke (Portland, Ore.), Joshua Patrick Williams (Portland, Ore.) and Yang-Hua Ou (Miaoli, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Aspects herein are directed to systems, methods, and articles for producing a patterned film and using the patterned film to form a pattern of discrete overlay film structures on a substrate material. A uniform thickness of a film material is deposited on to a first...