ALEXANDRIA, Va., June 2 -- United States Patent no. 12,642,705, issued on June 2, was assigned to NICHIBAN Co. LTD. (Tokyo) and THE UNIVERSITY OF TOKYO (Tokyo).
"Dressing material for puncture" was invented by Tatsuya Kanemaru (Tokyo), Kyohei Matsuo (Tokyo), Subaru Matsuo (Tokyo), Hiromi Sanada (Tokyo), Ryoko Murayama (Tokyo) and Mari Abe (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A dressing material for puncture of the present invention includes a support film, a frame sheet, and a release liner, which are laminated from an upper side in this order. An adhesive is used to bond the support film and the frame sheet, and bond the frame sheet and the release liner. The support film is a base material...