US Patent Issued to NGK INSULATORS on Oct. 6 for "Method for drying separation membrane and method for producing separation membrane structure" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,752,242, issued on Oct. 6, was assigned to NGK INSULATORS Ltd. (Nagoya, Japan).

"Method for drying separation membrane and method for producing separation membrane structure" was invented by Kenichi Noda (Nagoya, Japan) and Takeshi Hagio (Inazawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A drying method for a separation membrane includes supplying a gas for drying to the separation membrane so that a value obtained by dividing the difference between a maximum value and a minimum value of a flow rate of the gas for drying on a membrane surface of the separation membrane by the minimum value of the flow rate is less than or equal to 15%. The ga...