ALEXANDRIA, Va., April 21 -- United States Patent no. 12,606,915, issued on April 21, was assigned to NEXUSBE Co. LTD (Jeonju-si, South Korea).
"Roll-to-roll atomic layer deposition apparatus" was invented by Hag Young Choi (Yongin-si, South Korea), Dong Won Kim (Yongin-si, South Korea), Sang Hun Kim (Gwangju-si, South Korea) and Keun Sik Kim (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to an atomic layer deposition apparatus, and more particularly, to an atomic layer deposition apparatus for depositing an atomic layer on a flexible substrate.The roll-to-roll atomic layer deposition apparatus according to the embodiment of the present disclosure includ...