US Patent Issued to New York University on March 3 for "System to detect dielectric changes in matter" (New York Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,567,503, issued on March 3, was assigned to New York University (New York).

"System to detect dielectric changes in matter" was invented by Leeor Alon (New York) and Seena Dehkharghani (Larchmont, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system of reconstructing a dielectric image is provided. The system includes a data collection array to collect microwave scattering data. The system includes a machine learning device configured to receive the microwave scattering data, analyze the microwave scattering data, output a generated image based on the analyzed microwave scattering data, and identify at least one of a presence of disease, absence...